PVD Metal Target 99.9% Titanium Plate Targets

Titanium plate targets are a key material used in physical vapor deposition (PVD) technology, primarily deposited onto substrates via magnetron sputtering to form high-performance thin films. They are widely applied in fields such as semiconductors, flat panel displays, optical components, medical devices, and decorative coatings.

 

Core Features and Performance Metrics

1.High Purity Requirement: The purity of titanium plate targets typically ranges between 99.9% and 99.9999% (i.e., 3N to 6N grade). In semiconductor manufacturing, to meet the demands of 0.18μm and finer process requirements, the purity must reach 4N5 (99.995%) or even the 6N level.

2.High density: The theoretical density ranges from 4.506 to 4.51 g/cm³. The high density reduces internal porosity, enhances sputtering rate, and improves film compactness.
The grain size is fine and uniform, typically controlled at ≤50μm, with some high-end applications requiring a level as low as 30nm, which helps achieve a more uniform thickness distribution in the film.

3.Strict impurity control: Gaseous impurities such as oxygen, hydrogen, and nitrogen, as well as alkali metal content, must be controlled at ppm or even ppb levels to avoid affecting the electrical properties of the film.

During PVD or sputtering, a high-energy ion beam is directed at the titanium plate target, which causes the atoms in the target to be ejected and move toward the substrate surface. These ejected atoms deposit on the substrate surface and form a thin film or coating.

Titanium plate targets are widely used in industries such as aerospace, biomedical, electronics, and optics, among others, due to the unique properties of titanium, including its corrosion resistance, biocompatibility, and excellent mechanical and thermal stability.

Excellent adhesion: Thin films deposited from titanium plate targets exhibit good adhesion to various substrates, enabling the production of high-quality coatings and thin films with excellent mechanical properties.

Titanium plate targets possess several distinctive features that make them suitable for various applications.

1. Thin Film Deposition: Titanium plate sputtering targets are frequently used in physical vapor deposition (PVD) processes to deposit thin films onto substrates. These thin films can be used for functional coatings, such as wear resistance, corrosion resistance, or decorative purposes.

2. Semiconductor Manufacturing: In the semiconductor industry, titanium thin film targets are utilized in the fabrication of integrated circuits and other microelectronic devices. They are used in sputtering processes to deposit titanium layers for various applications, including barrier layers, interconnects, and contact layers.

3. Solar Energy: Titanium plate targets play a vital role in the production of photovoltaic cells and solar panels. They are used in sputtering systems to deposit transparent conductive oxide (TCO) layers, such as titanium oxide, which enhance the efficiency of solar cells by improving light transmission and electrical conductivity.

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